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Background
Integrated Complex Equipment
Background Equipment

Characteristics

  • Open modular frame structure without closed explosion-proof cabinet, lightweight design with compact footprint, compatible with Y-cylinders, T-drums, cylinder bundles and ISO bulk containers for large-volume gas storage.
  • Full UHP gas panel constructed with 316L EP electropolished stainless steel tubing, metal-to-metal VCR face-seal fittings, orbital welded in ISO Class 100 cleanroom, helium leak tested to ultra-low leakage rate to eliminate particle contamination risks.
  • Dual-stage pressure regulation system integrated with J-T heating modules, precision pressure transmitters and inline UHP filters, delivering stable, low-pulsation high-flow gas output for mass production lines.
  • Fully automatic PLC & HMI touchscreen control system, supporting automatic cylinder switchover, timed nitrogen purge, vacuum evacuation and vent circulation; equipped with weight monitoring and multi-level pressure interlock alarms with audible & visual reminders.
  • Complete safety interlock configuration including overpressure relief, excess flow cut-off, emergency shutdown function and gas leakage detection; all electrical components comply with SEMI industrial safety standards.
  • Flexible expandable layout, supporting multi-channel parallel gas pipelines with large-caliber pipe options to meet ultra-high flow demand; reserved Modbus/TCP Ethernet communication ports for seamless connection with fab central monitoring system.
  • Low operation & maintenance cost, easy cylinder replacement and internal component inspection without disassembling enclosed cabinet structures.

Applications

Application Background
Semiconductor wafer manufacturing fabs (8-inch & 12-inch mass production workshops)
PV solar cell & module production lines
Mini/Micro LED, OLED and FPD display panel fabrication
Optical fiber & optical coating industrial plants
Advanced material and electronic chemical research laboratories
Industrial thin-film deposition manufacturing factories

Suitable Occasions

Nitrogen

Independent dedicated bulk gas storage rooms with overall forced ventilation systems (not applicable for direct placement inside clean production bays)

Nitrogen

Mass production workshops with high daily gas consumption requiring continuous large-flow gas supply

Nitrogen

Production lines adopting inert or mild corrosive bulk specialty gases without pyrophoric/hyper-toxic ingredients

Nitrogen

Factory gas central distribution stations serving multiple production tools simultaneously

Nitrogen

Mid-to-large scale manufacturing plants pursuing low equipment procurement cost and flexible layout expansion

Nitrogen

Pilot production lines and R&D labs with standardized bulk gas supply demands

Suitable for Fluids

Application Background
Inert ultra-high purity gases: Nitrogen (N₂), Argon (Ar), Helium (He), Neon (Ne)
Mild corrosive non-pyrophoric process gases: Carbon Tetrafluoride (CF₄), Sulfur Hexafluoride (SF₆), Trifluoromethane (CHF₃), Carbon Dioxide (CO₂)
Clean dry air (CDA) and auxiliary purge nitrogen
Electronic-grade etching & doping bulk gases with low flammability and low toxicity
Mixed carrier gases for thin-film deposition processes

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