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Background
Integrated Complex Equipment
Background Equipment

Characteristics

  • Modular integrated multi-valve structure combining shut-off, balance, purge and exhaust valves to cut pipeline connection points and leakage risks
  • Compact monoblock design with high-purity seamless internal flow channels, available in 2/3/5-valve configurations
  • All-metal sealing joints with ultra-low helium leak rate, supporting threaded, face-seal and compression connections
  • Optional built-in sensor ports and ESD emergency cut-off ports for independent equipment gas control
  • Available in low/high pressure grades, with corrosion-resistant stainless steel or alloy body material

Applications

Application Background
Semiconductor wafer & optoelectronic manufacturing fabs
Third-generation semiconductor epitaxy production lines
Petrochemical, power and industrial automation plants
Fire protection and hydraulic & pneumatic control systems

Suitable Occasions

Nitrogen

Front-end piping of pressure & differential pressure transmitters for flow and liquid level measurement

Nitrogen

Gas cabinet pipeline for cylinder replacement purging and residual medium exhausting

Nitrogen

Branch pipeline terminals for independent gas supply control of single process equipment

Nitrogen

Calibration, maintenance and online blowdown without interrupting production

Suitable for Fluids

Application Background
Ultra-high purity inert process gases: N₂, Ar, O₂, clean dry air
Toxic, corrosive and pyrophoric specialty electronic gases
General industrial liquid media for pressure detection
Carrier gases for organometallic MO source vapor delivery

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