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Background
Integrated Complex Equipment
Background Equipment

Characteristics

  • Multi-channel integrated gas circuit layout with independent control for each pipeline
  • Equipped with pressure gauge and central emergency stop button for one-cut-off of all gas paths
  • Supports centralized purging, vacuuming and replacement operation of multiple cylinders
  • Standard ISO interface design, modular structure for easy installation and maintenance
  • High-purity seamless gas path components to avoid secondary contamination

Applications

Application Background
Semiconductor wafer fabs
Third-generation semiconductor epitaxy workshops
LED & optoelectronic manufacturing plants
Flat panel display production lines

Suitable Occasions

Nitrogen

Special gas cylinder cabinet area

Nitrogen

Central bulk gas supply station

Nitrogen

Gas replacement and pre-process purging stations

Nitrogen

MOCVD, etching, thin-film deposition process front-end

Suitable for Fluids

Application Background
Ultra-high purity bulk gases: N₂, O₂, Ar, H₂, CDA
Inert carrier gases for MO source delivery
Low-toxicity purging auxiliary gases

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