Search Search
Q&A
SUNTO Logo SUNTO Logo
Banner 1 Banner 1

MO SOURCE SUPPLY EQUIPMENT

This MO source supply cabinet stably transports liquid metal-organic precursors to process chambers with constant-temperature heated pipelines to avoid condensation. It supports single and dual dilution modes for precise vapor control, featuring uninterrupted supply, leak detection and auto safety cut-off. Suitable for MOCVD, ALCVD and diffusion epitaxy in optoelectronic & semiconductor fabs, compatible with TMGa, TMAL, DEZn, TEOS and other organometallic liquid precursors.

Home Process Tools LIQUID TOOLS MO SOURCE SUPPLY EQUIPMENT
Background
Integrated Complex Equipment
Background Equipment

Characteristics

  • ◆ Integrated cabinet system for stable delivery of liquid metal-organic precursors to process chambers
  • ◆ Constant temperature pipeline heating design to prevent precursor condensation and pipeline blockage
  • ◆ Dual dilution flow control architecture (single / push-flow double dilution) for precise vapor concentration regulation
  • ◆ Full closed-loop safety monitoring framework for hazardous liquid chemical transport

Main Features

Feature 1

Uninterrupted continuous liquid supply to avoid production pause

Feature 1

Real-time liquid leakage detection with automatic emergency cut-off interlock

Feature 1

Accurate vapor saturation pressure control via temperature and carrier gas adjustment

Feature 1

Modular mass flow control unit supports two dilution modes for flexible process matching

Feature 1

Fully sealed high-purity gas path to maintain consistent MO source vapor delivery

Applications

Application Background
◆ Third-generation semiconductor manufacturing
◆ LED & Micro-epitaxy production factories
◆ Advanced display and optoelectronic material workshops
◆ Silicon-based semiconductor chip fabs

Suitable Occasions

Nitrogen

MOCVD, ALCVD, CVD and diffusion epitaxy processes

Nitrogen

Epitaxial growth requiring precise MO source vapor dosage

Nitrogen

Quantum well, pre-deposition and high-intensity reaction processes

Nitrogen

Mass production lines for GaN, Si-based semiconductor thin films

Suitable for Fluids

Application Background
◆ Metal-organic liquid precursors: TMAL, TMGa, DEZn
◆ High-purity liquid silicon sources such as TEOS
◆ Other volatile liquid organometallic process chemicals for epitaxy

Get started with SUNTO

Cookies settings

It can achieve continuous and uninterruptedsafe supply of electronic-grade specialtygases at high flow rates and is mainlycontrolled by PLC. The touch screen is thehuman-machine interface.

You allow

- Cookies strictly required for the proper running of the website
These cookies are necessary for the website to work properly and allow us to guarantee you an optimal experience. They are automatically deleted when you leave the website, and do not collect any information about the user or their activity. You can block them by deactivating them from your browser settings, however your user experience may be negatively impacted.
+ Cookies strictly required for the proper running of the website
Additional details about strictly required cookies. These cookies help maintain basic functionalities and security features of the website.
+ Website performance cookies
These cookies allow us to count visits and traffic sources so we can measure and improve the performance of our site. They help us to know which pages are the most and least popular and see how visitors move around the site.
+ Third-party cookies
These cookies may be set through our site by our advertising partners. They may be used by those companies to build a profile of your interests and show you relevant adverts on other sites.

By giving consent to the purposes above, you also allow this website and its partners to operate the following data processing: Deliver and present advertising and content, Ensure security, prevent and detect fraud, and fix errors, Link different devices, Match and combine data from other data sources, and Save and communicate privacy choices.

Name *
Email *
Company
Position
Apply Now