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Background
Integrated Complex Equipment
Background Equipment

Characteristics

  • Open-frame panel gas distribution unit without enclosed cabinet and forced ventilation structure
  • Cost-effective simplified design dedicated to inert and low-hazard process gas delivery
  • Exposed layout with valves, pressure gauges and pipe fittings mounted directly on metal base plate
  • No active leakage protection, only equipped with basic passive gas safety components
  • Supports manual or semi-automatic operation with basic flow split function

Main Features

Feature 1

Simple mechanical structure for basic gas shunting and pressure regulation

Feature 1

Low overall cost with fewer functional modules for budget-friendly deployment

Feature 1

Equipped with standard check valves and pressure gauges for basic pipeline monitoring

Feature 1

Flexible layout design, easy to install, maintain and expand on-site

Feature 1

Manual switching control with optional semi-automatic auxiliary components00

Applications

Application Background
Semiconductor small-scale pilot production lines
Optical fiber and display laboratory research platforms
General precision electronic manufacturing workshops
University and institute advanced material labs

Suitable Occasions

Nitrogen

Laboratory auxiliary inert gas supply systems

Nitrogen

Small-batch low-risk process production lines

Nitrogen

Technical corridors with low safety risk standards

Nitrogen

Areas near gas cylinder storage with well-ventilated environment

Suitable for Fluids

Application Background
Inert high-purity process gases
Nitrogen (N₂), Argon (Ar), Helium (He)
Clean dry compressed air (CDA) and other non-toxic, non-flammable low-risk industrial gases

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