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Background
Integrated Complex Equipment
Background Equipment

Characteristics

  • Self-contained liquid evaporation unit built for high-precision, steady delivery of ultra-high-purity chemical vapor
  • Compact footprint with multi-sided configurable process ports for flexible factory layout integration
  • Fully sealed corrosion-resistant inner containment structure
  • Separated modular zones for electrical control, cooling and gas circuits for easy maintenance and safe operation
  • Closed-loop temperature and liquid level control to sustain stable vapor saturation during long continuous production runs

Main Features

Feature 1

High-performance vaporization module to produce homogeneous saturated vapor and reduce concentration deviation

Feature 1

Active linear liquid level sensor paired with auto-refill system to keep constant precursor output concentration

Feature 1

High-precision closed-loop thermal control to restrain temperature drift and avoid unstable vapor supply

Feature 1

Complete safety interlock system: exhaust monitoring, rate-of-rise fire detection, pressure interlock and leak-proof sealed cabinet doors

Feature 1

Expandable optional modules: remote drainage & chemical recovery pipeline, customizable carrier gas manifold, integrated auxiliary chiller

Feature 1

Multi-stage alarm protection against overheating, overpressure and low liquid level, enabling unmanned factory operation

Applications

Application Background
Semiconductor wafer fabrication
Photovoltaic cell manufacturing
Optical fiber preform production
Advanced microelectronics and thin-film component manufacturing

Suitable Occasions

Nitrogen

Front-end thin-film deposition processes (ALD, PEALD, CVD, MOCVD, epitaxy) that demand stable ultra-high-purity vapor supply

Nitrogen

Pilot research platforms for advanced material development

Nitrogen

Mass-production fabs requiring continuous feeding of liquid precursors

Suitable for Fluids

Application Background
Electronic-grade ultra-high-purity liquid precursors for thin-film deposition
Silicon tetrachloride (SiCl₄), trichlorosilane (TCS)
Other inorganic and organometallic liquid process chemicals

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