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LIQUID DELIVERY SYSTEM

UHP Liquid Delivery System delivers advanced precursors for CVD/ALD processes. With tight pressure control (±50 mbar), patented backup mode, smart empty control, and PLC-based operation, it ensures contamination-free, reliable precursor distribution.

Home Process Tools LIQUID TOOLS LIQUID DELIVERY SYSTEM
Background
Integrated Complex Equipment
Background Equipment

Characteristics

  • ◆ Precise pressure control: Tight delivery pressure control (±50 mbar) for stable liquid flow and vaporization
  • ◆ Reliability features: Patented back-up mode, smart empty control for 100% chemical usage, and validated chemical purge sequences
  • ◆ Control system: PLC-based technology with a 10" color touch screen for operation
  • ◆ Compatibility: Accepts any SEMI-compliant canister, with customized signal interfaces for OEM tools
  • ◆ Utilities requirements: Supports UHP He/N₂ (7barg, 10m³/hr), pneumatic air, exhaust (300m³/hr), vacuum (<1Torr), and UPS power (110/240VAC, 1kVA)

Main Features

Feature 1

Designed for contamination-free, reliable, and cost-saving delivery of advanced precursors

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Supports on-board bubbler refill and canister change-out sequences

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Back-up distribution mode ensures continuous operation

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mart empty control maximizes chemical utilization

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Optional upgrades: vacuum pump, degassing unit, 2-outlet manifold, remote monitoring (Profibus/Ethernet), and operator training

Applications

Application Background
◆ Semiconductor manufacturing processes
◆ Chemical Vapor Deposition (CVD)
◆ Atomic Layer Deposition (ALD)
◆ Processes involving advanced liquid precursors (e.g., TEOS, TEPO, TEB, 4MS, TMA, HCDS)

Suitable Occasions

Nitrogen

High-precision vaporization applications requiring stable pressure control

Nitrogen

Continuous manufacturing processes needing contamination-free precursor delivery

Nitrogen

Facilities with advanced semiconductor deposition tools

Suitable for Fluids

Application Background
◆ BPSG processes: TEOS, TEPO, TEB
◆ Low-k dielectrics: 4MS, DMDMOS, TMCTS, OMTCS, DMPS
◆ High-k dielectrics: TMA, TDMAS
◆ Low-T SiN: HCDS, BTBAS
◆ Other SEMI-compliant liquid chemicals for CVD/ALD processes

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It can achieve continuous and uninterruptedsafe supply of electronic-grade specialtygases at high flow rates and is mainlycontrolled by PLC. The touch screen is thehuman-machine interface.

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