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Background
Integrated Complex Equipment
Background Equipment

Characteristics

  • High-precision binary gas mixing with an allowable mixing accuracy of ±0.12%
  • Supports flow rates from 10 to 200 SLPM
  • Compatible with industrial communication protocols including Ethernet and Profibus
  • Built with high-quality components for reliability
  • Designed for stable pressure control with regulated gas source and delivery pressures
  • Compact and integrated cabinet design

Main Features

Feature 1

Binary gas mixing system for precise gas ratio control

Feature 1

Panel design with comprehensive gas distribution and safety schematics

Feature 1

High-precision mass flow control via Bronkhorst MFCs

Feature 1

Equipped with analyzers (Siemens) and detectors (Honeywell UV/IR) for gas monitoring

Feature 1

Safety components including check valves, safety relief valves, and filters

Applications

Application Background
Semiconductor manufacturing processes
Industrial gas distribution and delivery systems
Processes requiring precise, stable gas mixture ratios

Suitable Occasions

Nitrogen

Scenarios requiring continuous, high-precision binary gas mixing

Nitrogen

Processes using hydrogen-based mixtures with nitrogen or helium

Nitrogen

Environments needing reliable, monitored gas delivery with safety controls

Suitable for Fluids

Application Background
2%~4% H₂/N₂
2%~10% H₂/He
Other similar specialty gas mixtures
Hydrogen (H₂), Nitrogen (N₂), Helium (He) as primary components

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